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Single-target RF magnetron sputtering vacuum PVD coating machine

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Product
Single-target RF magnetron sputtering vacuum PVD coating machine
Posting date : Jul 17, 2020
Membership
Free Member Scince Jul 13, 2020
FOB Price
11000
Min. Order Quantity
1
Supply Abillity
50
Port
qingdao,shanghai,
Payment Terms
T/T, L/C, Pay Later,Western Union,VISA
Package
wooden box packaging
Keyword :
Category
Contact
jibin wang
Product Detail
Company Info
 
Quick Detail
Place of Origin
China [CN]
Brand Name
CYKY
Model Number
CY-MSP300S-RF
HS-CODE
8479-89
Package & Delivery Lead Time
Package
wooden box packaging
Detailed Description
Single-target RF magnetron sputtering coater CY-MSP300S-RF
Single-target RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization.
  • The magnetron target head has 1 inch 2 inches and 3 inches to choose from. Customers can choose the target according to the size of the substrate to be plated. 
  • The device is equipped with 300W RF power supply, which can be used for sputtering of non-metal film and optical film. According to the experimental requirements, other specifications of DC or RF power supply can be selected to realize the coating operation of various materials.
  • The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements.
  • The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency.
  • This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Single-target RF magnetron sputtering coater application:
The device can be used to prepare single-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the single-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for research on solid electrolyte and OLED in the laboratory.
Single-target RF magnetron sputtering coater technical parameters:
Sample stage
Size:φ185mm
Temperature control accuracy:±1℃
Heating temperature:Max 500℃
Rotate speed:1-20rpm adjustable
Magnetron Sputtering target head
2”×1 (1”,2”,3”optional)
Circulating water chiller with flow rate of 10L/min
Vacuum chamber
Chamber size:φ300mm×300mm
Watch window:φ100mm
Chamber material:Stainless steel
Opening mode:Top cover removable
Mass flow meter
2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)
Vacuum system
Model:CY-GZK103-A
Pumping interface:KF40
Molecular pump:CY-600
Exhaust interface:KF16
Backing pump:rotary vane pump
Vacuum measurement:Compound vacuum gauge
Ultimate vacuum:1.0E-5Pa
Power supply:AC;220V 50/60Hz
Pumping rate:Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Power configuration
RF power supply ×1;Max output power:300W
Other parameters
Supply voltage:AC220V,50Hz
Overall size:600mm×650mm×1280mm
Total power:2KW
Total Weight:300kg
 

ECROBOT CO., Ltd, Business Registration Number : 220-88-71747, CEO Park Jae Woo, TEL : +82-2-552-7676, E-mail : info@mesageitonias.com
Address : (Hwanghwa B/D 11F, Yeoksam-dong)320, Gangnam-daero, Gangnam-gu, Seoul, South Korea
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